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Contribution Oral

Budker INP - Conference Hall
SR technological application and X-ray apparatus

Manufacturing of high resolution X-ray masks for LIGA technology in SSTRC

Speakers

  • Aleksey LEMZYAKOV

Primary authors

Co-authors

Content

One of main problems in deep X-ray lithography (DXRL) is X-ray masks fabrication. The primary way to get high-resolution X-ray masks is to use soft X-ray lithography with intermediate X-ray mask. The soft X-ray lithography is performed at “LIGA” station of VEPP-3 synchrotron radiation (SR) source in Siberian Synchrotron and Terahertz Radiation Centre (SSTRC). In addition, the technique of fabrication of intermediate X-ray mask based on titanium membrane is developed.