X-ray lithographic fabrication of thick metal microstructures for terahertz applications
- Mr. Aleksandr GENTSELEV
- Mr. Aleksandr GENTSELEV (Budker INP, Novosibirsk, Russia)
- Dr. Fedor DULTSEV (Rzhanov Institute of Semiconductor Physics Siberian Branch of Russian Academy of Sciences)
- Mr. Sergei KUZNETSOV (Novosibirsk State University)
- Dr. Aleksandr ZELINSKY (INSTITUTE OF SOLID STATE CHEMISTRY AND MECHANOCHEMISTRY OF THE SIBERIAN BRANCH OF THE RUSSIAN ACADEMY OF SCIENCES (ISSC SB RAS))
The design and fabrication method for thick (with thickness up to ~1 mm) planar metal microstructures of subwavelength topology, intended to control electrodynamic characteristics of radiation beams in the terahertz (THz) range of the electromagnetic spectrum, are described. Such structures have a number of advantages as compared to pseudometallic microstructures made of polymethylmethacrylate (PMMA) with metallized surface. The latters are inferior to the former ones due to such drawbacks as shorter life (as a result of natural aging of the polymer), restrictions on the radiation power density for the impinging THz beams, etc. The structures made entirely of metal do not exhibit the aforementioned disadvantages.