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SUMMARY:Self-aligned single exposure deep x-ray lithography
DTSTART;VALUE=DATE-TIME:20200713T133300Z
DTEND;VALUE=DATE-TIME:20200713T133400Z
DTSTAMP;VALUE=DATE-TIME:20260419T142138Z
UID:indico-contribution-1045@indico.inp.nsk.su
DESCRIPTION:Speakers: Vladimir Nazmov (Budker Institute of Nuclear Physics
 )\nMicrodevices are usually made up of several interacting components that
  can be assembled on the basis of 3-dimensional LIGA structures\, using va
 rious techniques to fulfill the required positioning accuracy - the so-cal
 led combined LIGA technology [1]. As a part of the LIGA technology\, deep 
 X-ray lithography enables the formation of 3-D microstructures of signific
 ant size in each of the three dimensions\; however\, it is often possible 
 to improve positioning accuracy by using self-alignment technique when pat
 terning with the use of X-ray mask\, as shown in [2]. In our work\, we con
 sider single-exposure with self-alignment technique for the creation of mi
 crodevices of technological material\, which can demonstrate new physical 
 capabilities.   \n  \n[1] LIGA and Its Applications\, Ed.V. Saile\, U. Wal
 lrabe\, O. Tabata\, J G. Korvink\, 2008\, Wiley‐VCH Verlag\, Weinheim.  
  \n  \n[2] V.Nazmov\, E.Reznikova\, M.Boerner\, J.Mohr\, V.Saile\, A.Snigi
 rev\, I.Snigireva\, M.DiMichiel\, M.Drakopoulos\, R.Simon\, M.Grigoriev\, 
 Refractive lenses fabricated by deep SR lithography and LIGA technology fo
 r X-ray energies from 1 keV to 1 MeV. AIP Conf. Proc.\, 705(2004)752-755.\
 n\nhttps://indico.inp.nsk.su/event/24/contributions/1045/
LOCATION:
URL:https://indico.inp.nsk.su/event/24/contributions/1045/
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