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SUMMARY:FT-IR investigation of netlike polymerization of SU-8 resist layer
 s during photo- and X-ray lithography processes
DTSTART;VALUE=DATE-TIME:20200713T133600Z
DTEND;VALUE=DATE-TIME:20200713T133700Z
DTSTAMP;VALUE=DATE-TIME:20260513T222443Z
UID:indico-contribution-1788@indico.inp.nsk.su
DESCRIPTION:Speakers: Elena Reznikova ()\nLayers of multi-component SU-8 r
 esist\, which includes a diglycidyl ether of bisphenol A novolac as a mono
 mer\, were investigated by the FT-IR spectroscopic method for a wave numbe
 r range of 600 - 5000 cm-1 after each step of the photo and X-ray lithogra
 phy processes (coating\, pre-exposure baking\, exposure\, post-exposure ba
 king\, development). The doses of absorbed both photo and X-ray radiation 
 were varied from 0.1 to 6000 J/cm3 with uniform dose distribution in the l
 ayer depth. It was found that the monomers are bonded to each other in ini
 tial pre-polymer by means of the end disrupted epoxy groups. The band inte
 nsity at the 914 cm-1 wave number is decreased after heating of exposed SU
 -8 layer with an increase of a dose of absorbed radiation because of a dis
 ruption of the glycidyl groups. The disrupted bonds of the pre-polymer mol
 ecules connect to each other with a net polymer formation\, and the intens
 ities of FT-IR spectral bands at 1076\, 1110\, 1128 and 1150 cm-1 are enha
 nced. In contrast to photolithography\, an X-ray exposure results to a dis
 ruption of the epoxy groups of the pre-polymer molecules as well as a form
 ation of polymer ester bonds -C-O-C- during both the exposure process and 
 post-exposure baking. The relative quantity of disrupted epoxy groups and 
 the correspondent amount of a new formed polymer bonds in the resist layer
  are grown with an increase of the dose of the absorbed radiation up to sa
 turation at about 1000 J/cm3. The dose dependence of a relative number of 
 monomers in the insoluble phase of the residual polymer area after the dev
 elopment process corresponds to the characteristic curve of a relative res
 idual thickness of the resist layer. The dose of about 1 J/cm3 is a thresh
 old for an appearance of the insoluble phase of the layer on a substrate s
 urface. At approximately 30-60 J/cm3 the shrinkage and swelling of the lay
 er with the insoluble phase becomes close to zero. The mass ratios of the 
 insoluble and soluble phases in the resist layer in dependence on the dose
  of absorbed X-ray radiation were determined\, the quantity of absorbed ph
 otons and the track lengths of photo- and Auger-electrons were calculated 
 in order to model the SU-8 netlike polymerization. The physical-chemical p
 roperties of SU-8 polymer\, the mechanism and optimization of X-ray lithog
 raphy processes using synchrotron radiation are discussed.\nThis work is p
 artially supported by grant №19-42-540014 of Russian Foundation for Basi
 c Research and Government of Novosibirsk Region.\n\nhttps://indico.inp.nsk
 .su/event/24/contributions/1788/
LOCATION:
URL:https://indico.inp.nsk.su/event/24/contributions/1788/
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