Speaker
Mr
Rui De Oliveira
(CERN)
Description
CERN Micro Pattern Technologies workshop (CERN EP/DT/EF) is currently involved in one MPGD R&D project: “Study of resistive
materials for MPGD protection”, this study is conduct in the framework of RD51 collaboration. A group of four institutes has been
raised (Kobe, INFN Frascati, China and CERN) to address all the different aspects of this topic. The role of CERN MPT workshop in
the group is the development and production of new MPGD devices based on DLC layers developed and produced in Japan (Kobe
B/Sputter) and China (HEFEI). Several types of MPGDs have already been DLC-ied and characterized. A detailed production process
for RGEM, THGEM, RMmegas and uRwell will be presented during this talk.
Primary author
Mr
Rui De Oliveira
(CERN)
