Speaker
Mr
Stephane Melanson
(D-Pace Inc)
Description
Ion implantation requires a high beam current stability to ensure a uniform implantation dose across the wafers. This requires ion sources with a stable extraction system to achieve a high beam current stability. Our goal is to extract 0.5 mA of C2─ with less than 10 glitches per hour, with a glitch defined as any variation greater than +/- 5% of the nominal beam current. The beam energy should be between 10 keV and 30 keV while the normalized 4 RMS emittance should be less than 1 mm*mrad. We’ve shown that high negative carbon ion current densities could be obtained with a multi-cusp ion source when acetylene was used as the feed gas (0.25 mA of C2─), but there was significant sparking between the electrodes, which led to frequent beam current glitches (~1000 / hour). In this study, we investigate the different factors that contribute to the sparking between the electrodes. We found that the sparking is highly correlated to the dumping of the co-extracted electrons and the beam strike on the electrodes. Extraction simulations were completed to determine how the electron dumping can be improved and how the beam strikes on the electrodes can be reduced. Furthermore, we modified the magnetic configuration in the plasma chamber to decrease the electron density close to the extraction aperture, which reduced the co-extracted electron current by a factor of almost 5 and reduced sparking frequency to about 20 glitches per hour. However, there was a corresponding decrease in the extracted beam current due to the smaller aperture sizes needed to reduce the sparking, with only 0.05 mA of C2─.
Primary author
Mr
Stephane Melanson
(D-Pace Inc)
Co-authors
Dr
Chris Philpott
(Buckley Systems)
Mr
David Potkins
(D-Pace Inc)
Dr
Morgan Dehnel
(D-Pace Inc)
