Speaker
Aleksey Lemzyakov
(BINP SB RAS)
Description
One of main problems in deep X-ray lithography (DXRL) is X-ray masks fabrication.
The primary way to get high-resolution X-ray masks is to use soft X-ray lithography with intermediate X-ray mask. The soft X-ray lithography is performed at “LIGA” station of VEPP-3 synchrotron radiation (SR) source in Siberian Synchrotron and Terahertz Radiation Centre (SSTRC).
In addition, the technique of fabrication of intermediate X-ray mask based on titanium membrane is developed.
Primary author
Aleksey Lemzyakov
(BINP SB RAS)
Co-authors
Mr
Aleksandr Gentselev
(Budker INP, Novosibirsk, Russia)
Dr
Boris Goldenberg
(Budker INP SB RAS)
Mr
Vladimir Nazmov
(Budker Institute of Nuclear Physics)
