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Contribution Poster

SR technological application and X-ray apparatus

Conceptual design of synchrotron beamline combined Photoelectron, Emission and Absorption Spectroscopies and Reflectometry for studying Electronic Structure in soft and tender x-ray range

Speakers

  • Dr. Tatyana ASANOVA

Primary authors

Co-authors

Content

An undulator beamline with working name “Electronic structure” at the new synchrotron center SKIF (Novosibirsk, Russia) will be dedicated to advanced X-ray spectroscopies for studying electronic structure of the surface layers and in the bulk of different classes of compounds and functionalized materials with a high energy resolution in the x-ray range from 50 to 10000 eV. The beamline will consist of three beam stations. The first beam station will be based on X-ray Photoelectron Spectrometer making use such techniques as angle-resolved X-ray Photoelectron Spectroscopy (AR-XPS), HArd X-ray PhotoElectron Spectroscopy (HAXPES) and X-ray absorption near edge structure(XANES) under different conditions. The AR-XPS station will provide information about band structure, element composition, chemical states and local geometry of each elements which are present in the sample under study. Thanks to non-destructive HAXPES, one is indispensable in characterization of bulk materials, buried interfaces of multi-layered functional materials or as-grown samples. The second beam station will be based on a crystal spectrometer intended for x-ray emission spectroscopy (XES), which is also used for Resonant Inelastic X-ray scattering (RIXS), High Energy Resolution Fluorescent detected XANES or partially fluorescent yield(PFY) XANES. By combining the tunable incident energy with an x-ray emission spectrometer, resonance effects can be used for providing detailed information on the bulk electronic structure: studying spin-orbital interaction between electrons, configuration of electronic orbitals participating in chemical bonds as well as local structure of the probed element. The third beam station named as X-ray Reflectometry is dedicated to determine the optical properties of samples in transmission or reflection.
The work will present a conceptual design of Electronic Structure Beamline and advanced application fields.