Speakers
Mr
Aleksandr Gentselev
(Budker INP, Novosibirsk, Russia)
Dr
Boris Goldenberg
(Budker INP SB RAS)
Dr
Konstantin Kuper
(Budker Institute of Nuclear Physics)
Description
The design and method of manufacturing high-contrast LIGA masks for deep X-ray lithography in the spectral range 0.5÷3Å are described.
Gold was used as the material of the masking layer. Creation of this layer on the surface of the silicon plate was carried out by electro forming through a resistive mask. The bearing membrane and the support ring of the X-mask were formed by removing the central part of the plate by ion-beam etching it from the back side. Testing the quality and contrast of the finished LIGA masks was done at the X-ray microscopy station VEPP-3.
Primary author
Mr
Aleksandr Gentselev
(Budker INP, Novosibirsk, Russia)
Co-authors
Dr
Boris Goldenberg
(Budker INP SB RAS)
Dr
Fedor Dultsev
(Rzhanov Institute of Semiconductor Physics Siberian Branch of Russian Academy of Sciences)
Dr
Konstantin Kuper
(Budker Institute of Nuclear Physics)
