Fabrication of silicon LIGA masks

Not scheduled
15m
Conference Hall (Budker INP)

Conference Hall

Budker INP

Lavrentiev av. 11, Novosibirsk 630090 Russia
Poster SR technological application and X-ray apparatus

Speakers

Mr Aleksandr Gentselev (Budker INP, Novosibirsk, Russia)Dr Boris Goldenberg (Budker INP SB RAS)Dr Konstantin Kuper (Budker Institute of Nuclear Physics)

Description

The design and method of manufacturing high-contrast LIGA masks for deep X-ray lithography in the spectral range 0.5÷3Å are described. Gold was used as the material of the masking layer. Creation of this layer on the surface of the silicon plate was carried out by electro forming through a resistive mask. The bearing membrane and the support ring of the X-mask were formed by removing the central part of the plate by ion-beam etching it from the back side. Testing the quality and contrast of the finished LIGA masks was done at the X-ray microscopy station VEPP-3.

Primary author

Mr Aleksandr Gentselev (Budker INP, Novosibirsk, Russia)

Co-authors

Dr Boris Goldenberg (Budker INP SB RAS) Dr Fedor Dultsev (Rzhanov Institute of Semiconductor Physics Siberian Branch of Russian Academy of Sciences) Dr Konstantin Kuper (Budker Institute of Nuclear Physics)

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