Fabrication X-ray masks with multilayer bearing membranes

Not scheduled
15m
Conference Hall (Budker INP)

Conference Hall

Budker INP

Lavrentiev av. 11, Novosibirsk 630090 Russia
Poster SR technological application and X-ray apparatus

Speakers

Mr Aleksandr Gentselev (Budker INP, Novosibirsk, Russia)Mr Aleksey Lemzyakov (Budker INP SB RAS)Dr Boris Goldenberg (Budker INP SB RAS)

Description

The design and manufacturing method of x-ray masks, which have high-contrast in x-ray spectral range of shorter wavelengths (λ ≈ 3÷7 Å), are described. This masks can be a tool to form a resistive mask with a thickness of ~20÷150 microns and also can be used as intermediate mask for the fabrication of LIGA-masks for deep X-ray lithography. The manufacturing method is based on silicon planar technology. Two types of masks were made with mainly aluminum membrane. The method ensures the manufacture of x-ray masks with multilayer (titanium, aluminum and silicon layers, the thickness of which can vary in a fairly wide range) bearing membranes.

Primary author

Mr Aleksandr Gentselev (Budker INP, Novosibirsk, Russia)

Co-authors

Mr Aleksandr Gelfand (Rzhanov Institute of Semiconductor Physics Siberian Branch of Russian Academy of Sciences) Mr Aleksey Lemzyakov (Budker INP SB RAS) Dr Boris Goldenberg (Budker INP SB RAS) Dr Fedor Dultsev (Rzhanov Institute of Semiconductor Physics Siberian Branch of Russian Academy of Sciences)

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