Speaker
Mr
Aleksandr Gentselev
(Budker INP, Novosibirsk, Russia)
Description
The design and fabrication method for self-supporting mesh structures, used as high-contrast LIGA-masks in x-ray lithography of the wavelength range λ ≈ 0,5÷3 Å, are described. The LIGA-masks are produced by through-thickness patterning a solid tungsten foil fixed on a supporting ring using reactive ion-beam etching through a resistive mask of a corresponding topology. The LIGA-masks of this type are intended for manufacturing afterwards thick planar metal microstructures playing a role of quasi-optical filters in the terahertz range of the electromagnetic spectrum.
Primary author
Mr
Aleksandr Gentselev
(Budker INP, Novosibirsk, Russia)
Co-authors
Dr
Fedor Dultsev
(Rzhanov Institute of Semiconductor Physics Siberian Branch of Russian Academy of Sciences)
Mr
Sergei Kuznetsov
(Novosibirsk State University)
Mr
Vladimir Kondratyev
(Budker Institute of Nuclear Physics of SB RAS)
