New manufacturing method of a stamp for fabrication biochips

Not scheduled
15m
Conference Hall (Budker INP)

Conference Hall

Budker INP

Lavrentiev av. 11, Novosibirsk 630090 Russia
Poster SR technological application and X-ray apparatus

Speaker

Mr Aleksandr Gentselev (Budker INP, Novosibirsk, Russia)

Description

A new manufacturing method of a stamp or a mold is described. They can be used to mold biochips of various plastics. A typical sequence of operations in LIGA technology is as follows: the formation of a thick resistive mask by deep x-ray lithography, the creation of a stamp (or mold) by galvanoplasty and the manufacture of plastic products using a stamp (or mold). This report describes a different sequence of operations: the formation of a thick resistive mask by deep photolithography on the working surface of blank of stamp (or mold), creating a relief of stamp by ion-beam reactive etching through a resistive mask, stamping (or casting) of plastic products, using the resulting stamp (or mold).

Primary author

Mr Aleksandr Gentselev (Budker INP, Novosibirsk, Russia)

Co-authors

Mr Aleksandr Varand (Budker Institute of Nuclear Physics of SB RAS) Dr Fedor Dultsev (Rzhanov Institute of Semiconductor Physics Siberian Branch of Russian Academy of Sciences) Mr Vladimir Kondratyev (Budker Institute of Nuclear Physics of SB RAS)

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