Microdevices are usually made up of several interacting components that can be assembled on the basis of 3-dimensional LIGA structures, using various techniques to fulfill the required positioning accuracy - the so-called combined LIGA technology . As a part of the LIGA technology, deep X-ray lithography enables the formation of 3-D microstructures of significant size in each of the three dimensions; however, it is often possible to improve positioning accuracy by using self-alignment technique when patterning with the use of X-ray mask, as shown in . In our work, we consider single-exposure with self-alignment technique for the creation of microdevices of technological material, which can demonstrate new physical capabilities.
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